![Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment | Protocol (Translated to Hebrew) Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment | Protocol (Translated to Hebrew)](https://www.jove.com/files/ftp_upload/52720/52720fig3large.jpg)
Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment | Protocol (Translated to Hebrew)
![Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment | Protocol (Translated to Hebrew) Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment | Protocol (Translated to Hebrew)](https://www.jove.com/files/ftp_upload/52720/52720fig4large.jpg)
Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment | Protocol (Translated to Hebrew)
![Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment | Protocol (Translated to Hebrew) Selective Area Modification of Silicon Surface Wettability by Pulsed UV Laser Irradiation in Liquid Environment | Protocol (Translated to Hebrew)](https://www.jove.com/files/ftp_upload/52720/52720fig5large.jpg)